Hoʻomaka a me ka ʻike maʻalahi o ka uhi ʻana i ka ʻūhā (3)

Sputtering Coating Ke hoʻokuʻu ʻia nā ʻāpana ikaika kiʻekiʻe i ka ʻili paʻa, hiki i nā ʻāpana ma ka ʻili paʻa ke loaʻa ka ikehu a pakele i ka ʻili e waiho ʻia ma ka substrate.Hoʻomaka ka hoʻohana ʻia ʻana o ka sputtering i ka ʻenehana uhi i ka makahiki 1870, a hoʻohana mālie ʻia i ka hana ʻoihana ma hope o 1930 ma muli o ka piʻi ʻana o ka helu deposition.Hōʻike ʻia nā mea hoʻohana maʻamau ʻelua pole sputtering ma ke Kiʻi 3 [Schematic diagram of two vacuum coating pole sputtering].ʻO ka mea maʻamau ka mea e waiho ʻia e hana ʻia i kahi pā-he pahu hopu, i hoʻopaʻa ʻia ma ka cathode.Hoʻokomo ʻia ka substrate ma luna o ka anode e kū pono ana i ka ʻili i hoʻopaʻa ʻia, he mau kenimika ka mamao mai ka pahu hopu.Ma hope o ka hoʻoheheʻe ʻia ʻana o ka ʻōnaehana i kahi ʻūhā kiʻekiʻe, hoʻopiha ʻia me ka 10 ~ 1 Pa gas (maʻamau argon), a hoʻohana ʻia kahi volta o kekahi mau tausani volts ma waena o ka cathode a me ka anode, a ua hana ʻia kahi hoʻokuʻu glow ma waena o nā electrodes ʻelua. .ʻO nā ion maikaʻi i hana ʻia e ka hoʻokuʻu ʻana e lele i ka cathode ma lalo o ka hana a kahi māla uila a hui pū me nā ʻātoma ma ka ʻili i hoʻopaʻa ʻia.Ua kapa ʻia nā ʻātoma i hoʻopaʻa ʻia i pakele mai ka ʻili i hoʻopaʻa ʻia ma muli o ke kuʻi ʻana, ʻo nā ʻātoma sputtering, a ʻo ko lākou ikehu aia ma ka laulā o ka 1 a hiki i nā ʻumi o nā electron volts.Hoʻokomo ʻia nā ʻātoma sputtered ma ka ʻili o ka substrate e hana i kahi kiʻiʻoniʻoni.ʻAʻole e like me ka uhi ʻana o ka evaporation, ʻaʻole i kaupalena ʻia ka hoʻoheheʻe ʻana o ka mea kiʻiʻoniʻoni, a hiki ke hoʻoheheʻe i nā mea refractory e like me W, Ta, C, Mo, WC, TiC, a me nā mea ʻē aʻe. 'ano, 'o ia ho'i, ke kinoea reactive (O, N, HS, CH, etc.).

hoʻohui ʻia i ke kinoea Ar, a hoʻopili ke kinoea reactive a me kona mau ion me ka ʻātoma i hoʻopaʻa ʻia a i ʻole ka ʻātoma sputtered e hana i kahi hui (e like me ka oxide, nitrogen) Compounds, etc.) a waiho ʻia ma ka substrate.Hiki ke hoʻohana ʻia kahi ʻano sputtering kiʻekiʻe e waiho i ke kiʻi insulating.Hoʻokomo ʻia ka substrate ma ka electrode grounded, a kau ʻia ka pahuhopu insulating ma ka electrode kūʻē.Hoʻokumu ʻia kekahi hopena o ka mana alapine kiʻekiʻe, a ua hoʻopili ʻia kekahi ʻaoʻao i kahi electrode i hoʻolako ʻia me kahi pahuhopu insulating ma o kahi pūnaewele pili a me kahi capacitor blocking DC.Ma hope o ka hoʻololi ʻana i ka mana alapine kiʻekiʻe, hoʻololi mau ka volta kiʻekiʻe i kona polarity.Ua paʻi nā electrons a me nā iona maikaʻi i loko o ka plasma i ka pahuhopu insulating i ka wā o ka hapa pōʻai maikaʻi a me ka hapa pōʻai maikaʻi ʻole o ka volta.No ka mea, ʻoi aku ka kiʻekiʻe o ka neʻe electron ma mua o nā ion maikaʻi, ʻoi aku ka maikaʻi o ka ʻili o ka pahu insulating.Ke hiki i ka equilibrium dynamic, aia ka pahu hopu ma kahi hiki ke hoʻohālikelike maikaʻi ʻole, no laila e hoʻomau nā ion maikaʻi e sputtering ma ka pahu hopu.Hiki i ka hoʻohana ʻana i ka magnetron sputtering ke hoʻonui i ka helu deposition ma kahi kokoke i kahi kauoha o ka nui i hoʻohālikelike ʻia me ka sputtering non-magnetron.


Ka manawa hoʻouna: Iulai-31-2021